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OCoLC |
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20220616050538.0 |
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850315t19841984waua b 101 0 eng |
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|a EEME[c.1]
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|a 621.381/74
|2 19
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|a TR940 .O69 1984
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245 |
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|a Optical microlithography III :
|b technology for the next decade : March 14-15, 1984, Santa Clara, California /
|c Harry L. Stover, chairman/editor.
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260 |
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|a Bellingham, Wash., USA :
|b SPIE--the International Society for Optical Engineering,
|c [1984], ©1984.
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300 |
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|a vi, 269 pages :
|b illustrations ;
|c 28 cm.
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336 |
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|a text
|b txt
|2 rdacontent
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337 |
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|a unmediated
|b n
|2 rdamedia
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338 |
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|a volume
|b nc
|2 rdacarrier
|
490 |
1 |
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|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 470
|
504 |
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|a Includes bibliographies and index.
|
650 |
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0 |
|a Photolithography
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh85101379
|
650 |
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0 |
|a Integrated circuits
|x Very large scale integration
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh2008104263
|
700 |
1 |
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|a Stover, Harry L.
|0 http://id.loc.gov/authorities/names/n82148501
|
710 |
2 |
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|a Society of Photo-optical Instrumentation Engineers.
|0 http://id.loc.gov/authorities/names/n78088934
|
740 |
0 |
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|a Optical microlithography 3.
|
740 |
0 |
|
|a Optical microlithography three.
|
830 |
|
0 |
|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 470.
|0 http://id.loc.gov/authorities/names/n42030541
|
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|p Can Circulate
|a Michigan State University-Library of Michigan
|b Michigan State University
|c MSU Remote Storage
|d MSU Remote Storage
|t 0
|e TR940 .O69 1984
|h Library of Congress classification
|i Printed Material
|m 31293004854471
|n 1
|