Optical microlithography III : technology for the next decade : March 14-15, 1984, Santa Clara, California / Harry L. Stover, chairman/editor.

Bibliographic Details
Uniform Title:Proceedings of SPIE--the International Society for Optical Engineering ; v. 470.
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Stover, Harry L.
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1984], ©1984.
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 470.
Subjects:
Genre:
Physical Description:vi, 269 pages : illustrations ; 28 cm.
Format: Book

MARC

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