Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California / Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Stover, Harry L.
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1983], ©1983.
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 394.
Subjects:	Photolithography > Congresses. Integrated circuits > Very large scale integration > Congresses.
Genre:	Congresses.
Physical Description:	vi, 251 pages : illustrations ; 28 cm.
Format:	Book

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