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OCoLC |
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830609t19831983waua b 101 0 eng |
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|a 83050213
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|a 0892524294 (pbk.)
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|a (OCoLC)10089962
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|a EEME[c.1]
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|a 621.381/74
|2 19
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| 090 |
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|a TR940 .O68 1983
|
| 245 |
0 |
0 |
|a Optical microlithography II :
|b technology for the 1980s : March 16-17, 1983, Santa Clara, California /
|c Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.
|
| 260 |
|
|
|a Bellingham, Wash., USA :
|b SPIE--the International Society for Optical Engineering,
|c [1983], ©1983.
|
| 300 |
|
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|a vi, 251 pages :
|b illustrations ;
|c 28 cm.
|
| 336 |
|
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|a text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a unmediated
|b n
|2 rdamedia
|
| 338 |
|
|
|a volume
|b nc
|2 rdacarrier
|
| 490 |
1 |
|
|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 394
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 650 |
|
0 |
|a Photolithography
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh85101379
|
| 650 |
|
0 |
|a Integrated circuits
|x Very large scale integration
|v Congresses.
|0 http://id.loc.gov/authorities/subjects/sh2008104263
|
| 700 |
1 |
|
|a Stover, Harry L.
|0 http://id.loc.gov/authorities/names/n82148501
|
| 710 |
2 |
|
|a Society of Photo-optical Instrumentation Engineers.
|0 http://id.loc.gov/authorities/names/n78088934
|
| 740 |
0 |
|
|a Optical microlithography 2.
|
| 740 |
0 |
|
|a Optical microlithography two.
|
| 830 |
|
0 |
|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 394.
|0 http://id.loc.gov/authorities/names/n42030541
|
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|p Can Circulate
|a Michigan State University-Library of Michigan
|b Michigan State University
|c MSU Remote Storage
|d MSU Remote Storage
|t 0
|e TR940 .O68 1983
|h Library of Congress classification
|i Printed Material
|m 31293004854489
|n 1
|
