Results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage : ion implanted dopants in silicon / John Albers.

Bibliographic Details
Uniform Title:	NBS special publication ; 400-79. Semiconductor measurement technology.
Main Author:	Albers, John
Corporate Authors:	United States. Defense Advanced Research Projects Agency United States. National Bureau of Standards
Language:	English
Published:	Gaithersburg, MD : U.S. Department of Commerce, National Bureau of Standards, 1987.
Series:	NBS special publication ; 400-79. Semiconductor measurement technology.
Subjects:	Semiconductor doping > Computer simulation. Ion implantation > Computer simulation. Monte Carlo method.
Physical Description:	iv, 667 pages : illustrations ; 28 cm.
Format:	Government Document Book

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