Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
| Uniform Title: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 471. |
|---|---|
| Corporate Author: | |
| Other Authors: | |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE--the International Society for Optical Engineering,
[1984], ©1984.
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 471. |
| Subjects: | |
| Genre: | |
| Physical Description: | vi, 136 pages : illustrations ; 28 cm. |
| Format: | Book |
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