X-ray diffraction at elevated temperatures : a method for in situ process analysis / D.D.L. Chung [and others].

Bibliographic Details
Other Authors: Chung, Deborah D. L.
Language:English
Published: New York : VCH, [1993], ©1993.
Subjects:
X-rays > Diffraction.
X-rays > Industrial applications.
Physical Description:viii, 268 pages : illustrations ; 25 cm
Format: Book
Description
Call Number:QC482.D5 X74 1993
Bibliography Note:Includes bibliographical references and index.
ISBN:0895737450
3527278427