Interlaboratory study on linewidth measurements for antireflective chromium photomasks / John M. Jerke, M. Carroll Croarkin, Ruth N. Varner ; sponsored jointly by NBS and the Defense Advanced Research Projects Agency.

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Bibliographic Details
Uniform Title:	Semiconductor measurement technology. NBS special publication ; 400-74.
Main Author:	Jerke, John M.
Corporate Authors:	National Engineering Laboratory (U.S.) United States. Defense Advanced Research Projects Agency
Other Authors:	Croarkin, Carroll Varner, Ruth N.
Language:	English
Published:	Washington, D.C. : U.S. Department of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. G.p.O., 1982.
Series:	Semiconductor measurement technology. NBS special publication ; 400-74.
Subjects:	Integrated circuits > Masks. Optical measurements.
Physical Description:	vii, 183 pages : illustrations ; 28 cm.
Format:	Government Document Book

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