Interlaboratory study on linewidth measurements for antireflective chromium photomasks / John M. Jerke, M. Carroll Croarkin, Ruth N. Varner ; sponsored jointly by NBS and the Defense Advanced Research Projects Agency.

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Bibliographic Details
Uniform Title:Semiconductor measurement technology.
NBS special publication ; 400-74.
Main Author: Jerke, John M.
Corporate Authors: National Engineering Laboratory (U.S.)
United States. Defense Advanced Research Projects Agency
Other Authors: Croarkin, Carroll
Varner, Ruth N.
Language:English
Published: Washington, D.C. : U.S. Department of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. G.p.O., 1982.
Series:Semiconductor measurement technology.
NBS special publication ; 400-74.
Subjects:
Integrated circuits > Masks.
Optical measurements.
Physical Description:vii, 183 pages : illustrations ; 28 cm.
Format: Government Document Book

MARC

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245 1 0 |a Interlaboratory study on linewidth measurements for antireflective chromium photomasks /  |c John M. Jerke, M. Carroll Croarkin, Ruth N. Varner ; sponsored jointly by NBS and the Defense Advanced Research Projects Agency. 
260 |a Washington, D.C. :  |b U.S. Department of Commerce, National Bureau of Standards :  |b For sale by the Supt. of Docs., U.S. G.p.O.,  |c 1982. 
300 |a vii, 183 pages :  |b illustrations ;  |c 28 cm. 
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490 1 |a Semiconductor measurement technology 
490 1 |a NBS special publication ;  |v 400-74 
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500 |a Microform. 
504 |a Includes bibliographical references. 
650 0 |a Integrated circuits  |x Masks.  |0 http://id.loc.gov/authorities/subjects/sh85067122 
650 0 |a Optical measurements.  |0 http://id.loc.gov/authorities/subjects/sh85095156 
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700 1 |a Varner, Ruth N.  |0 http://id.loc.gov/authorities/names/n82157813 
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710 1 |a United States.  |b Defense Advanced Research Projects Agency.  |0 http://id.loc.gov/authorities/names/n79004228 
830 0 |a Semiconductor measurement technology.  |0 http://id.loc.gov/authorities/names/n42022064 
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