Plasma etching : fundamentals and applications / M. Sugawara ; with contributions from Barry L. Stonsfield [and others].
| Uniform Title: | Series on semiconductor science and technology ;
7. |
|---|---|
| Main Author: | |
| Other Authors: | |
| Language: | English |
| Published: |
New York :
Oxford University Press,
1998.
|
| Series: | Series on semiconductor science and technology ;
7. |
| Subjects: | |
| Physical Description: | viii, 347 pages : illustrations (some color) ; 24 cm. |
| Format: | Book |
System Under Maintenance
Our Library Management System is currently under maintenance.
Holdings and item availability information is currently unavailable. Please accept our apologies for any inconvenience this may cause and contact us for further assistance:
Please contact Reference and Discovery Services via their Contact Form or call them directly at: 517-353-8700 for assistance.